SENTECH at SEMICON CHINA 2017 & SNEC Show 2017
In April 2017 two of the major exhibition highlights for SENTECH took place in China. The SEMICON China 2017 was a must attend event for us.The SNEC 2017 PV Power EXPO which is the world leading photovoltaic exhibition was attended by SENTECH as well.The presentation of new plasma etching and deposition applications to the Chinese market as well as the promotion of the newly launched SENperc PV were the highlights of the two exhibitions.
(firmenpresse) - In April 2017 two of the major exhibition highlights for SENTECH took place in China. As we are experts in leading edge plasma process technology equipment for etching and deposition, as well as thin film measurement instrumentation, the SEMICON China 2017 was a must attend event for us. Our representative booth attracted many guests and led to fruitful discussions with the Chinese SENTECH staff. The presentation of new plasma etching and deposition applications to the Chinese market were the highlights of the exhibition.
Plasma etching and deposition cluster tools for industrial and R&D applications were our topic at the SEMICON China 2017. SENTECH cluster configurations are combinations of etch, deposition and/or ALD technologies. Semiconductor and dielectric materials are processed automatically without interruption of vacuum and with high throughput. Cassette loading is available optionally. Therefore, SENTECH cluster configurations are especially suited for industrial applications.
Further, SENTECH presentation focused on new applications of our top selling plasma etching and deposition systems SI 500 and SI 500 D. Customer oriented applications for industrial use were our main target. The results of deep etching of fused silica, through silicon vias and trenches especially attracted the interest of our guests. The unique results of a very low etching rate combined with damage less ICP etching for GaN devices and the newest results of etching of InP pillars were of great interest too. In the field of plasma enhanced deposition we focused on ICPECVD using liquid precursors and the applications of silane and TEOS based deposition processes for the isolation of high aspect ratio TSV’s.
The SNEC 2017 PV Power EXPO which is the world leading photovoltaic exhibition was attended by SENTECH as well. Taking place on April 19-21, 2017 in Shanghai, the SNEC 2017 exhibitors presented innovative solutions and new products for the production of clean and sustainable energy. Highlight of the SENTECH booth was the SENperc PV. This tool was newly innovated; it is applied for quality control for PERC back side manufacturing. At SNEC 2016 the SENperc PV was awarded as one of the Top 10 Highlights. The SENTECH visitors were highly interested in exploring how this tool features quality control of double (SiNx/Al2O3) and single layers (Al2O3, SiNx) on the backside of mc-Si and c-Si cells.
SENTECH presented furthermore the well-known metrology products SE 400adv PV and SE 800 PV. Both products are the standard products for film thickness measurements of ARC coatings. Easy to operate, high measurement sensitivity, depolarization correction, and special light collecting optics are the main features of these tools. Both ellipsometer tools have proved itself on the Asian market through their reliability and high quality measurements.
We want to thank all our guests and of course the staff from SENTECH China for a successful SEMICON China 2017 and SNEC 2017. For more information on our Cluster Tools, Plasma etchers and PECVD systems as well as our metrology tools for Photovoltaics please contact us.
Themen in dieser Pressemitteilung:
plasma-etching
plasma-deposition
load-lock
pecvd
photovoltaic
photovoltaics
perc-cells
perc-solar-cells
perc-cells-measurement
Unternehmensinformation / Kurzprofil:
SENTECH Instruments develops, manufactures, and globally sells innovative capital equipment centered on thin films in semiconductor technology, microsystems, photovoltaics, nanotechnology and materials research. SENTECH is expert in structuring and deposition of thin films by means of plasma process technology. SENTECH offers systems for plasma etching, plasma enhanced chemical vapour deposition, and atomic layer deposition. SENTECH provides innovative solutions for non-contact, non-invasive optical characterization using ellipsometry and reflectometry.
Founded in 1990, SENTECH is a reliable partner to industry and scientific institutions with leading edge equipment, global sales and service network.
SENTECH’s motto “Erfolg durch Leistung” is a continuing commitment of all employees to achieve success by high standard of efficiency and customer service.
Datum: 08.05.2017 - 10:45 Uhr
Sprache: Deutsch
News-ID 1503015
Anzahl Zeichen: 3650
contact information:
Contact person: P. Romanowski
Town:
Berlin
Phone: +49 30 63 92 55 20,
Kategorie:
Automotive
Typ of Press Release: bitte
type of sending: Veröffentlichung
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