SENTECH Seminar on Ellipsometry and Reflectometry for characterizing thin films 2015
SENTECH experts in thin film measurement kindly invite you to our annual seminar “Ellipsometry and Reflectometry for characterizing thin films”.
(firmenpresse) - Focus of this seminar will be on spectroscopic ellipsometry and reflectometry for the analysis of thin films. The contributions of external experts from research and industry, e.g. on cryo ellipsometry and on quality control of PERC cells will be particularly interesting.
SENTECH experts will give presentations on our recent developments. SENDURO® MEMS is the solution to automated process control in MEMS and sensor manufacturing. Furthermore there will be a presentation on in situ process optimization with the new ALD Real Time Monitor.
This application oriented event will take place at the Commundo-Tagungshotel Stuttgart/ University Campus of Stuttgart on June 18th, 2015. The talks will be given in German. After the contributions, you are kindly invited to a demonstration of SENTECH ellipsometers and reflectometers in the application lab. The agenda is to be downloaded at our website.
Please register for the seminar at sales(at)sentech.de using our registration form as soon as possible, as the number of participants is limited to 30. Attendance fee: 180,00 € incl. VAT.Hotel bookings in the Commundo Hotel are possible upon request. For further questions please contact SENTECH via telephone: +49 89 897 9607-0.
Themen in dieser Pressemitteilung:
ellipsometry
spectroscopic-ellipsometry
reflectometry
thin-film-measurement
thin-film
thin-films
metrology
thin-film-metrology
seminar-metrology
Unternehmensinformation / Kurzprofil:
SENTECH Instruments is a leading supplier of plasma process technology equipment for etching and deposition and thin film metrology instruments based on ellipsometry.
Datum: 18.05.2015 - 09:47 Uhr
Sprache: Deutsch
News-ID 1359525
Anzahl Zeichen: 0
contact information:
Contact person: Pia Romanowski
Town:
Berlin
Phone: +49 30 63 92 55 20
Kategorie:
Advertising, PR and Marketing
Anmerkungen:
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