SENTECH at the ALD China Conference 2014
SENTECH new ALD Real Time Monitor was presented in Asia at the 3rd China ALD Conference. For the first time the patented monitor allows the direct monitoring of absorption and desorption processes on the substrate surface during ALD processes within ALD half cycles.
(firmenpresse) - Dr. Gargouri, SENTECH specialist for ALD processes, gave a speech during the conference. “Using the ALD Real Time Monitor enables efficient and fast process optimization” Dr Gargouri points out. “With this new tool SENTECH has shown that we have an outstanding Know How in fields of metrology equipment & ALD “.
The 3rd China ALD Conference hold from 16-17 of October 2014 in Shanghai was the ideal event to interchange with the Asian ALD society. It was especially attended by experts from the Asian region. Numerous talks between SENTECH representatives and participants of the conference showed the broad interest in SENTECH ALD equipment and especially in the new Real Time Monitor.
For information on SENTECH ALD applications contact u!
Themen in dieser Pressemitteilung:
ellipsometer
real-time-monitoring
insitu-monitoring
ald-insitu
real-time-monitor
insitu-ellipsometry
ellipsometry
atomic-layer-deposition
plasma-etching
plasma-deposition
Unternehmensinformation / Kurzprofil:
SENTECH manufactures and sells leading edge equipment for plasma etching and deposition, atomic layer deposition and thin film measurements.
Datum: 17.11.2014 - 04:22 Uhr
Sprache: Deutsch
News-ID 1318754
Anzahl Zeichen: 0
contact information:
Contact person: Pia Romanowski
Town:
Berlin
Phone: 0 30 63 92 55 20
Kategorie:
Semiconductors
Anmerkungen:
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Die Pressemitteilung mit dem Titel:
"SENTECH at the ALD China Conference 2014
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